Invention Grant
- Patent Title: Method of fabricating a surface probing device
- Patent Title (中): 制造表面探测装置的方法
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Application No.: US11120553Application Date: 2005-05-03
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Publication No.: US07691661B2Publication Date: 2010-04-06
- Inventor: Stephen C. Minne
- Applicant: Stephen C. Minne
- Applicant Address: US NY Plainview
- Assignee: Veeco Instruments, Inc.
- Current Assignee: Veeco Instruments, Inc.
- Current Assignee Address: US NY Plainview
- Agency: Boyle Fredrickson, S.C.
- Main IPC: H01L21/302
- IPC: H01L21/302

Abstract:
A method of making a probe having a cantilever and a tip include providing a substrate having a surface and forming a tip extending substantially orthogonally from the surface. The method includes depositing an etch stop layer on the substrate, whereby the etch stop layer protects the tip during process. A silicon nitride layer is then deposited on the etch stop layer. An etch operation is used to release the cantilever and expose the etch stop layer protecting the tip. Preferably, the tip is silicon and the cantilever supporting the tip, preferably via the etch stop layer, is silicon nitride. A probe for a surface analysis instrument made according to the method includes a tip and a silicon nitride cantilever having a thickness defined during the deposition process.
Public/Granted literature
- US20050210967A1 Method of fabricating a surface probing device and probing device produced thereby Public/Granted day:2005-09-29
Information query
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