Invention Grant
- Patent Title: Large area semiconductor on glass insulator
- Patent Title (中): 玻璃绝缘子大面积半导体
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Application No.: US11517908Application Date: 2006-09-08
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Publication No.: US07691730B2Publication Date: 2010-04-06
- Inventor: Kishor Purushottam Gadkaree , Alexandre Michel Mayolet
- Applicant: Kishor Purushottam Gadkaree , Alexandre Michel Mayolet
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Bruce P. Watson; Timothy M. Schaeberle; Matthew B. Dernier
- Main IPC: H01L21/36
- IPC: H01L21/36

Abstract:
Methods and apparatus provide for contacting respective first surfaces of a plurality of donor semiconductor wafers with a glass substrate; bonding the first surfaces of the plurality of donor semiconductor wafers to the glass substrate using electrolysis; separating the plurality of donor semiconductor wafers from the glass substrate leaving respective exfoliation layers bonded to the glass substrate; and depositing a further semiconductor layer on exposed surfaces of the exfoliation layers to augment a thickness of the exfoliation layers.
Public/Granted literature
- US20070117354A1 Large area semiconductor on glass insulator Public/Granted day:2007-05-24
Information query
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