Invention Grant
- Patent Title: Translucent material and manufacturing method of the same
- Patent Title (中): 半透明材料和制造方法相同
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Application No.: US11662251Application Date: 2006-03-29
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Publication No.: US07691765B2Publication Date: 2010-04-06
- Inventor: Masayuki Suzuki , Tomotake Ikada
- Applicant: Masayuki Suzuki , Tomotake Ikada
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2005-104615 20050331
- International Application: PCT/JP2006/306492 WO 20060329
- International Announcement: WO2006/106745 WO 20061012
- Main IPC: C04B35/50
- IPC: C04B35/50 ; C04B35/51 ; C04B35/00 ; B29C67/00 ; H05B6/00

Abstract:
After synthesizing particles by liquid phase synthesis, the solution is substituted without drying these particles, and here, a solution comprising a grain boundary phase composition consisting of at least one or more types selected from a group consisting of Al2O3, yttrium oxide, silicon oxide, yttrium-silicon complex oxide, aluminum-silicon complex oxide, and a compound having a garnet structure with a lower melting point than the aforementioned particles, or a solution comprising a precipitate is introduced. Microparticles are adjusted by allowing adhesion and growth of the solution comprising a composition of grain boundary phase or the solution comprising a precipitate on the surface of the particles; these microparticles are allowed to align in 3-dimensions in solution and are formed into a molded body, and this molded body is sintered.
Public/Granted literature
- US20090081100A1 Translucent material and manufacturing method of the same Public/Granted day:2009-03-26
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