Invention Grant
US07691783B2 Transfer substrate, method for fabricating display device, and display device
失效
转印基板，显示装置的制造方法以及显示装置
- Patent Title: Transfer substrate, method for fabricating display device, and display device
- Patent Title (中): 转印基板，显示装置的制造方法以及显示装置
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Application No.: US11380032Application Date: 2006-04-25
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Publication No.: US07691783B2Publication Date: 2010-04-06
- Inventor: Eisuke Matsuda , Masao Nishiguchi
- Applicant: Eisuke Matsuda , Masao Nishiguchi
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sonnenschein Nath & Rosenthal LLP
- Priority: JPP2005-128909 20050427
- Main IPC: B41M5/035
- IPC: B41M5/035 ; B41M5/46 ; B41M5/50
Abstract:
A transfer substrate includes a support base which transmits laser light with a predetermined wavelength, a photothermal conversion layer provided on the support base, and a transfer layer provided on the photothermal conversion layer, the transfer layer including at least a luminescent layer. The photothermal conversion layer is composed of a first material and a second material having different absorptances with respect to the laser light.
Public/Granted literature
- US20060246240A1 TRANSFER SUBSTRATE, METHOD FOR FABRICATING DISPLAY DEVICE, AND DISPLAY DEVICE Public/Granted day:2006-11-02
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