Invention Grant
US07691915B2 Photosensitive resin composition for forming organic insulating film and device using the same
有权
用于形成有机绝缘膜的感光树脂组合物及使用其的装置
- Patent Title: Photosensitive resin composition for forming organic insulating film and device using the same
- Patent Title (中): 用于形成有机绝缘膜的感光树脂组合物及使用其的装置
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Application No.: US11924753Application Date: 2007-10-26
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Publication No.: US07691915B2Publication Date: 2010-04-06
- Inventor: Min Sung Kim , Sang Won Cho , Dong Ju Shin , Kil Sung Lee
- Applicant: Min Sung Kim , Sang Won Cho , Dong Ju Shin , Kil Sung Lee
- Applicant Address: KR Gumi-si
- Assignee: Cheil Industries Inc.
- Current Assignee: Cheil Industries Inc.
- Current Assignee Address: KR Gumi-si
- Agency: Summa, Additon & Ashe, P.A.
- Priority: KR10-2006-0127180 20061213
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/028
Abstract:
Disclosed is a photosensitive resin composition. The composition comprises [A] an alkali-soluble resin, [B] a photoactive compound and [C] a solvent. The alkali-soluble resin is a copolymer including at least one structural unit with an aziridine group. The composition exhibits good storage stability, high sensitivity, high UV transmittance, high residual film ratio, improved coating uniformity and excellent pattern-forming properties. Further disclosed is an organic insulating film formed using the composition. The organic insulating film has excellent resistance to solvents and chemicals.
Public/Granted literature
- US20080145786A1 Photosensitive Resin Composition for Forming Organic Insulating Film and Device Using the Same Public/Granted day:2008-06-19
Information query
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