Invention Grant
US07692018B2 Process for producing high purity 3,5-dihydroxy-6-heptenoic acid derivative
失效
高纯度3,5-二羟基-6-庚烯酸衍生物的制备方法
- Patent Title: Process for producing high purity 3,5-dihydroxy-6-heptenoic acid derivative
- Patent Title (中): 高纯度3,5-二羟基-6-庚烯酸衍生物的制备方法
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Application No.: US10568347Application Date: 2004-09-22
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Publication No.: US07692018B2Publication Date: 2010-04-06
- Inventor: Yuji Yoshimura , Masami Yasukawa , Syuji Morikiyo , Yasutaka Takada , Hiroo Matsumoto
- Applicant: Yuji Yoshimura , Masami Yasukawa , Syuji Morikiyo , Yasutaka Takada , Hiroo Matsumoto
- Applicant Address: JP Tokyo
- Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2003-346019 20031003
- International Application: PCT/JP2004/014289 WO 20040922
- International Announcement: WO2005/033083 WO 20050414
- Main IPC: C07D215/12
- IPC: C07D215/12

Abstract:
A process for producing a high purity 3,5-dihydroxy6-heptenoic acid derivative by controlling the content of impurities such as denatured substances, is provided. When a 3,5-dihydroxy-6-heptenoic acid derivative is produced by a process which comprises a step of contacting the 3,5-dihydroxy-6-heptenoic acid derivative of the formula (1) wherein R is a C1-4 alkyl group, with a C1-4 lower alcohol-containing solvent, an alcohol containing solvent having its content of an oxidizing substance lowered, is used to at most 0.05 molar equivalent to a 3,5-dihydroxy-6-heptenoic acid derivative, to suppress impurities contained in the 3,5-dihydroxy-6heptenoic acid derivative.
Public/Granted literature
- US20060229451A1 Process for producing high purity 3,5-dihydroxy-6-heptenoic acid derivative Public/Granted day:2006-10-12
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