Invention Grant
- Patent Title: Method for producing fluorine-containing halide
- Patent Title (中): 含氟卤化物的制造方法
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Application No.: US10593322Application Date: 2005-03-11
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Publication No.: US07692048B2Publication Date: 2010-04-06
- Inventor: Akinari Sugiyama , Kazuyoshi Ichihara , Noriyuki Shinoki , Toshiya Mantani , Masahiro Kondou
- Applicant: Akinari Sugiyama , Kazuyoshi Ichihara , Noriyuki Shinoki , Toshiya Mantani , Masahiro Kondou
- Applicant Address: JP Osaka-shi
- Assignee: Daikin Industries, Ltd.
- Current Assignee: Daikin Industries, Ltd.
- Current Assignee Address: JP Osaka-shi
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2004-085295 20040323; JP2004-201299 20040708
- International Application: PCT/JP2005/004302 WO 20050311
- International Announcement: WO2005/090270 WO 20050929
- Main IPC: C07C19/08
- IPC: C07C19/08

Abstract:
The present invention provides a method for producing a fluorine-containing halide, comprising reacting a fluorine-containing sulfonyl halide or fluorine-containing disulfonyl chloride with a metal halide or metal component in the present or absence of a solvent. In accordance with the present invention, a fluorine-containing bromide, fluorine-containing iodide or fluorine-containing chloride can be readily produced in high yield at low cost, using an industrially advantageous process.
Public/Granted literature
- US20070185355A1 Method for producing fluorine-containing halide Public/Granted day:2007-08-09
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