Invention Grant
- Patent Title: Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
- Patent Title (中): 电子束曝光或系统检查或测量装置及其方法和高度检测装置
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Application No.: US11925142Application Date: 2007-10-26
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Publication No.: US07692144B2Publication Date: 2010-04-06
- Inventor: Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
- Applicant: Masahiro Watanabe , Takashi Hiroi , Maki Tanaka , Hiroyuki Shinada , Yasutsugu Usami
- Applicant Address: JP
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP9-216604 19970811
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G21K7/00

Abstract:
A method and apparatus for assessing a height of a specimen includes an electron beam unit having an electron beam source, lenses, a table for setting a specimen and controllable in a height direction, and a detector, and a height detection system for detecting height of the specimen set on the table while the specimen is irradiated by an electron beam. The height detection system further includes an illumination system, a collection system, first and second detectors, a device configured to receive output signals from the first and second detectors while the specimen is irradiated by the electron beam and to generate a comparison signal from the output signals, wherein the comparison signal is responsive to the height of the specimen.
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