Invention Grant
- Patent Title: Charged beam drawing apparatus
- Patent Title (中): 充电光束拉制装置
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Application No.: US11710930Application Date: 2007-02-27
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Publication No.: US07692158B2Publication Date: 2010-04-06
- Inventor: Munehiro Ogasawara
- Applicant: Munehiro Ogasawara
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2006-099133 20060331
- Main IPC: G21K1/08
- IPC: G21K1/08 ; H01J1/00

Abstract:
A charged beam drawing apparatus deflects, by an electrostatic deflector, a charged beam generated from a charged beam source, and applies the charged beam to a desired position on a sample to draw a pattern. The electrostatic deflector includes a plurality of deflecting electrodes arranged symmetrically with respect to a point around an optical axis of the charged beam, a ground external cylinder which is disposed coaxially with the optical axis and which is provided to enclose the deflecting electrodes, a resistive film provided on an inner surface of the ground external cylinder, and a conductive film provided on a surface of the resistive film. A capacitance is formed between the deflecting electrodes and the conductive film, and a resistance is formed between the ground conductor and the conductive film.
Public/Granted literature
- US20070228297A1 Charged beam drawing apparatus Public/Granted day:2007-10-04
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