Invention Grant
US07692169B2 Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus
失效
用于从辐射束中过滤颗粒并用于光刻设备的过滤器的方法
- Patent Title: Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus
- Patent Title (中): 用于从辐射束中过滤颗粒并用于光刻设备的过滤器的方法
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Application No.: US11493848Application Date: 2006-07-27
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Publication No.: US07692169B2Publication Date: 2010-04-06
- Inventor: Levinus Pieter Bakker , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
- Applicant: Levinus Pieter Bakker , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: H05G2/00
- IPC: H05G2/00
Abstract:
A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.
Public/Granted literature
- US20070023693A1 Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus Public/Granted day:2007-02-01
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