Invention Grant
- Patent Title: Gallium-nitride based light emitting diode light emitting layer structure
- Patent Title (中): 氮化镓基发光二极管发光层结构
-
Application No.: US11458392Application Date: 2006-07-19
-
Publication No.: US07692181B2Publication Date: 2010-04-06
- Inventor: Cheng-Tsang Yu , Liang-Wen Wu , Tzu-Chi Wen , Fen-Ren Chien
- Applicant: Cheng-Tsang Yu , Liang-Wen Wu , Tzu-Chi Wen , Fen-Ren Chien
- Applicant Address: TW Taoyuan
- Assignee: Formosa Epitaxy Incorporation
- Current Assignee: Formosa Epitaxy Incorporation
- Current Assignee Address: TW Taoyuan
- Main IPC: H01L31/00
- IPC: H01L31/00

Abstract:
A number of light-emitting layer structures for the GaN-based LEDs that can increase the lighting efficiency of the GaN-based LEDs on one hand and facilitate the growth of epitaxial layer with better quality on the other hand are provided. The light-emitting layer structure provided is located between the n-type GaN contact layer and the p-type GaN contact layer. Sequentially stacked on top of the n-type GaN contact layer is the light-emitting layer containing a lower barrier layer, at least one intermediate layer, and an upper barrier layer. That is, the light-emitting layer contains at least one intermediate layer interposed between the upper and lower barrier layers. When there are multiple intermediate layers inside the light-emitting layer, there is an intermediate barrier layer interposed between every two immediately adjacent intermediate layers.
Public/Granted literature
- US20060249727A1 Gallium-Nitride Based Light Emitting Diode Light Emitting Layer Structure Public/Granted day:2006-11-09
Information query
IPC分类: