Invention Grant
- Patent Title: Organic semiconductor material and organic device using the same
- Patent Title (中): 有机半导体材料和使用其的有机器件
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Application No.: US11723537Application Date: 2007-03-20
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Publication No.: US07692187B2Publication Date: 2010-04-06
- Inventor: Masayuki Chikamatsu , Atsushi Itakura , Tatsumi Kimura , Satoru Shimada , Yuji Yoshida , Reiko Azumi , Kiyoshi Yase
- Applicant: Masayuki Chikamatsu , Atsushi Itakura , Tatsumi Kimura , Satoru Shimada , Yuji Yoshida , Reiko Azumi , Kiyoshi Yase
- Applicant Address: JP Tokyo
- Assignee: National Institute of Advanced Industrial Science and Technology
- Current Assignee: National Institute of Advanced Industrial Science and Technology
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-076111 20060320
- Main IPC: H01L51/30
- IPC: H01L51/30

Abstract:
The present invention encompasses an organic field-effect transistor comprising an n-type organic semiconductor formed of a fullerene derivative having a fluorinated alkyl group which is expressed by the following chemical formula (wherein at least any one of R1, R2 and R3 is a perfluoro alkyl group or a partially-fluorinated semifluoro alkyl group each having a carbon number of 1 to 20), and a field-effect transistor production method comprising forming an organic semiconductor layer using the fullerene derivative by a solution process, and subjecting the organic semiconductor layer to a heat treatment in an atmosphere containing nitrogen or argon or in vacuum to provide enhanced characteristics to the organic semiconductor layer. The present invention makes it possible to form an organic semiconductor layer by a solution process and provide an organic field-effect transistor excellent in electron mobility and on-off ratio and capable of operating even in an ambient air atmosphere.
Public/Granted literature
- US20070215872A1 Organic semiconductor material and organic device using the same Public/Granted day:2007-09-20
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