Invention Grant
- Patent Title: Nitride semiconductor light-emitting device
-
Application No.: US12314062Application Date: 2008-12-03
-
Publication No.: US07692200B2Publication Date: 2010-04-06
- Inventor: Takeshi Kamikawa , Yoshika Kaneko , Kensaku Motoki
- Applicant: Takeshi Kamikawa , Yoshika Kaneko , Kensaku Motoki
- Applicant Address: JP Osaka JP Osaka
- Assignee: Sharp Kabushiki Kaisha,Sumitomo Electric Industries, Ltd.
- Current Assignee: Sharp Kabushiki Kaisha,Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka JP Osaka
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2003-153621 20030530
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
A nitride semiconductor light-emitting device wherein a substrate or nitride semiconductor layer has a defect concentration region and a low defect density region other than the defect concentration region. A portion including the defect concentration region of the nitride semiconductor layer or substrate has a trench region deeper than the low defect density region. Thus by digging the trench in the defect concentration region, the growth detection is uniformized, and the surface planarity is improved. The uniformity of the characteristic in the wafer surface leads to improvement of the yield.
Public/Granted literature
- US20090092166A1 Nitride semiconductor light-emitting device Public/Granted day:2009-04-09
Information query
IPC分类: