Invention Grant
- Patent Title: Method of producing a wafer scale package
- Patent Title (中): 制造晶片级封装的方法
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Application No.: US11690384Application Date: 2007-03-23
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Publication No.: US07692256B2Publication Date: 2010-04-06
- Inventor: Hartmut Rudmann , Stephan Heimgartner , Markus Rossi
- Applicant: Hartmut Rudmann , Stephan Heimgartner , Markus Rossi
- Applicant Address: FI Espoo
- Assignee: Heptagon Oy
- Current Assignee: Heptagon Oy
- Current Assignee Address: FI Espoo
- Agency: Rankin, Hill & Clark LLP
- Main IPC: H01L27/14
- IPC: H01L27/14 ; H01L29/82 ; H01L21/00

Abstract:
A method for manufacturing a wafer scale package including at least one substrate having replicated optical elements. The method uses two substrates, at least one of which is pre-shaped and has at least one recess in its front surface. Optical elements are replicated on a first substrate by causing a replication tool to abut the first substrate. The second substrate is then attached to the first substrate in an abutting relationship in such a way that the optical element is contained in a cavity formed by the recess in one of the substrates in combination with the other substrate. Thereby, a well defined axial distance between the optical elements and the second substrate is achieved. Consequently, a well defined axial distance between the optical elements and any other objects attached to the second substrate, e.g. further optical elements, image capturing devices, light sources, is also established.
Public/Granted literature
- US20080230934A1 METHOD OF PRODUCING A WAFER SCALE PACKAGE Public/Granted day:2008-09-25
Information query
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