Invention Grant
- Patent Title: High voltage GaN transistors
- Patent Title (中): 高压GaN晶体管
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Application No.: US11603427Application Date: 2006-11-21
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Publication No.: US07692263B2Publication Date: 2010-04-06
- Inventor: Yifeng Wu , Primit Parikh , Umesh Mishra
- Applicant: Yifeng Wu , Primit Parikh , Umesh Mishra
- Applicant Address: US CA Goleta
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US CA Goleta
- Agency: Koppel, Patrick, Heybl & Dawson
- Main IPC: H01L29/93
- IPC: H01L29/93

Abstract:
A multiple field plate transistor includes an active region, with a source, a drain, and a gate. A first spacer layer is over the active region between the source and the gate and a second spacer layer over the active region between the drain and the gate. A first field plate on the first spacer layer is connected to the gate. A second field plate on the second spacer layer is connected to the gate. A third spacer layer is on the first spacer layer, the second spacer layer, the first field plate, the gate, and the second field plate, with a third field plate on the third spacer layer and connected to the source. The transistor exhibits a blocking voltage of at least 600 Volts while supporting a current of at least 2 Amps with an on resistance of no more than 5.0 mΩ-cm2, of at least 600 Volts while supporting a current of at least 3 Amps with an on resistance of no more than 5.3 mΩ-cm2, of at least 900 Volts while supporting a current of at least 2 Amps with an on resistance of no more than 6.6 mΩ-cm2, or a blocking voltage of at least 900 Volts while supporting a current of at least 3 Amps with an on resistance of no more than 7.0 mΩ-cm2.
Public/Granted literature
- US20080116492A1 High voltage GaN transistors Public/Granted day:2008-05-22
Information query
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