Invention Grant
- Patent Title: Electrically rewritable non-volatile memory element and method of manufacturing the same
- Patent Title (中): 电可重写非易失性存储元件及其制造方法
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Application No.: US11334504Application Date: 2006-01-19
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Publication No.: US07692272B2Publication Date: 2010-04-06
- Inventor: Isamu Asano , Natsuki Sato , Wolodymyr Czubatyj , Jeffrey P. Fournier
- Applicant: Isamu Asano , Natsuki Sato , Wolodymyr Czubatyj , Jeffrey P. Fournier
- Applicant Address: JP Tokyo
- Assignee: Elpida Memory, Inc.
- Current Assignee: Elpida Memory, Inc.
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Main IPC: H01L31/0264
- IPC: H01L31/0264

Abstract:
A non-volatile memory element comprises a bottom electrode 12; a top electrode 15; and a recording layer 13 containing phase change material and a block layer 14 that can block phase change of the recording layer 13, provided between the bottom electrode 12 and the top electrode 15. The block layer 14 is constituted of material having an electrical resistance that is higher than that of material constituting the recording layer 13. The block layer 14 suppresses the radiation of heat towards the top electrode 15 and greatly limits the phase change region when a write current is applied. The result is a high heating efficiency. The top electrode 15 itself can be used to constitute a bit line, or a separate bit line can be provided.
Public/Granted literature
- US20070164267A1 Electrically rewritable non-volatile memory element and method of manufacturing the same Public/Granted day:2007-07-19
Information query
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