Invention Grant
- Patent Title: Semiconductor apparatus having improved thermal fatigue life
- Patent Title (中): 具有改善的热疲劳寿命的半导体装置
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Application No.: US11834734Application Date: 2007-08-07
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Publication No.: US07692299B2Publication Date: 2010-04-06
- Inventor: Chikara Nakajima , Takeshi Kurosawa , Megumi Mizuno
- Applicant: Chikara Nakajima , Takeshi Kurosawa , Megumi Mizuno
- Applicant Address: JP JP
- Assignee: Hitachi Haramachi Electronics Co., Ltd.,Hitachi, Ltd.
- Current Assignee: Hitachi Haramachi Electronics Co., Ltd.,Hitachi, Ltd.
- Current Assignee Address: JP JP
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2006-217207 20060809
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/02 ; H01L23/049 ; H01L23/28 ; H01L23/31

Abstract:
A semiconductor apparatus having improved thermal fatigue life is provided by lowering maximum temperature on jointing members and reducing temperature change. A jointing member is placed between a semiconductor chip and a lead electrode, and a thermal stress relaxation body is arranged between the chip and a support electrode. Jointing members are placed between the thermal stress relaxation body and the chip and between the thermal stress relaxation body and the support electrode. A second thermal stress relaxation body made from a material having a thermal expansion coefficient between the coefficients of the chip and the lead electrode is located between the chip and the lead electrode. The first thermal stress relaxation body is made from a material which has a thermal expansion coefficient in between the coefficients of the chip and the support electrode, and has a thermal conductivity of 50 to 300 W/(m·° C.).
Public/Granted literature
- US20080036088A1 SEMICONDUCTOR APPARATUS Public/Granted day:2008-02-14
Information query
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