Invention Grant
- Patent Title: Electron beam systems
- Patent Title (中): 电子束系统
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Application No.: US11829412Application Date: 2007-07-27
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Publication No.: US07692390B2Publication Date: 2010-04-06
- Inventor: Karsten Zosel
- Applicant: Karsten Zosel
- Applicant Address: DE
- Assignee: All Welding Technologies AG
- Current Assignee: All Welding Technologies AG
- Current Assignee Address: DE
- Agency: Tucker Ellis & West LLP
- Priority: DE102006035793 20060728
- Main IPC: H05B39/04
- IPC: H05B39/04

Abstract:
A high-power amplifier having a current-adding array is provided for high-speed driving of an inductive element, e.g., a deflection coil of an electron beam gun. The amplifier includes a first voltage node (U1) and a second voltage node (UV), at least one of which is connected to a regulated power supply, and a plurality of first switchable bridges (B11, B12, B13, . . . , B1k) connected in parallel between the first and second voltage nodes. Each switchable bridge includes at least one resistor (R11, R12, R13, . . . , R1k) with a resistance value that is selected so that a first resistor (R11) has a first resistance value WR11 equal to Rmin, a second resistor (R12) has a second resistance value WR12 greater than or equal to WR11 and an n-th resistor has an n-th resistance value WR1n greater than or equal to WR1n−1.
Public/Granted literature
- US20080143278A1 Electron Beam Systems Public/Granted day:2008-06-19
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