Invention Grant
US07692545B2 Wireless IC tag and process for manufacturing the same 失效
无线IC标签及其制造工艺

  • Patent Title: Wireless IC tag and process for manufacturing the same
  • Patent Title (中): 无线IC标签及其制造工艺
  • Application No.: US11596111
    Application Date: 2004-05-18
  • Publication No.: US07692545B2
    Publication Date: 2010-04-06
  • Inventor: Mitsuo Usami
  • Applicant: Mitsuo Usami
  • Applicant Address: JP Tokyo
  • Assignee: Hitachi, Ltd.
  • Current Assignee: Hitachi, Ltd.
  • Current Assignee Address: JP Tokyo
  • Agency: Stites & Harbison PLLC
  • Agent Juan Carlos A. Marquez, Esq.
  • International Application: PCT/JP2004/007048 WO 20040518
  • International Announcement: WO2005/112195 WO 20051124
  • Main IPC: G08B13/14
  • IPC: G08B13/14
Wireless IC tag and process for manufacturing the same
Abstract:
There is a problem related to radio wave interference, e.g. the shade of radio wave of a radio IC tag, when a plurality of radio IC tags are present in a region of electromagnetic wave. When a plurality of antennas each having a large area are present in the vicinity of the radio IC tag, the radio IC tag easily receives the affect of an antenna conductor. In a plurality of radio IC tags present in a radio wave area, width of the antenna conductor of the radio IC tag is set at 1.0 mm or less. Furthermore, in order to realize an antenna conductor having a small width, an IC tag chip of both side electrode structure having electrodes on the front surface and rear surface of a chip is sandwiched between antennas.
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