Invention Grant
- Patent Title: Liquid immersion exposure apparatus, method of controlling the same, and device manufacturing method
- Patent Title (中): 液浸式曝光装置及其控制方法以及装置的制造方法
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Application No.: US11196348Application Date: 2005-08-04
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Publication No.: US07692760B2Publication Date: 2010-04-06
- Inventor: Satoshi Akimoto
- Applicant: Satoshi Akimoto
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2004-229812 20040805
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A liquid immersion exposure apparatus including a stage which carries a substrate, a projection lens unit which projects a pattern onto the substrate, a unit which supplies liquid to a space between the substrate and the projection lens unit and recovers the liquid from the space, and a controller which controls driving of the stage. The controller changes a driving profile of the stage according to a liquid immersion condition.
Public/Granted literature
- US20060028630A1 Liquid immersion exposure apparatus, method of controlling the same, and device manufacturing method Public/Granted day:2006-02-09
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