Invention Grant
- Patent Title: Exposure apparatus
- Patent Title (中): 曝光装置
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Application No.: US11387684Application Date: 2006-03-24
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Publication No.: US07692763B2Publication Date: 2010-04-06
- Inventor: Takeo Kihara , Issei Funayoshi
- Applicant: Takeo Kihara , Issei Funayoshi
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2005-087710 20050325
- Main IPC: G03B27/42
- IPC: G03B27/42

Abstract:
A device manufacturing apparatus includes a conveying device which conveys a substrate, an acquiring device to acquire an amount of warpage of the substrate, based on a measurement or an input, a storing device which stores a database representing a correspondence between a parameter related to a conveying condition and the warpage amount of the substrate, and a controller which controls, based on the database, the conveying device to convey the substrate in accordance with a parameter corresponding to the warpage amount acquired by the acquiring device.
Public/Granted literature
- US20060216025A1 Exposure apparatus Public/Granted day:2006-09-28
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