Invention Grant
- Patent Title: Lithographic apparatus and method of removing liquid
- Patent Title (中): 平版印刷设备和除去液体的方法
-
Application No.: US11708686Application Date: 2007-02-21
-
Publication No.: US07692765B2Publication Date: 2010-04-06
- Inventor: Hernes Jacobs , Erik Roelof Loopstra , Michel Riepen , Eva Mondt
- Applicant: Hernes Jacobs , Erik Roelof Loopstra , Michel Riepen , Eva Mondt
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/58

Abstract:
A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap.
Public/Granted literature
- US20080198344A1 Lithographic apparatus and method of removing liquid Public/Granted day:2008-08-21
Information query