Invention Grant
- Patent Title: Projection optical system and exposure apparatus with the same
- Patent Title (中): 投影光学系统和曝光设备相同
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Application No.: US10584508Application Date: 2004-12-21
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Publication No.: US07692767B2Publication Date: 2010-04-06
- Inventor: Tomowaki Takahashi
- Applicant: Tomowaki Takahashi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2003-426617 20031224
- International Application: PCT/JP2004/019097 WO 20041221
- International Announcement: WO2005/062101 WO 20050707
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42

Abstract:
A projection optical system comprises eight reflectors and forms a reduced image of a first surface (4) onto a second surface (7). It comprises a first reflective imaging optical system (G1) for forming an intermediate image of the first surface and a second reflective imaging optical system (G2) for forming an image of the intermediate image onto the second surface. The first reflective imaging optical system includes a first reflector (M1), a second reflector (M2), a third reflector (M3), and a fourth reflector (M4) successively as light enters from the first surface side. The second reflective imaging optical system includes a fifth reflector (M5), a sixth reflector (M6), a seventh reflector (M7), and an eighth reflector (M8) successively as light enters from the first surface side. This realizes a reflective projection optical system which can favorably correct aberrations while having a favorable reflection characteristic with respect to X-rays and keeping the reflectors from becoming bulky.
Public/Granted literature
- US20070126990A1 Projection optical system and exposure apparatus with the same Public/Granted day:2007-06-07
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