Invention Grant
- Patent Title: Proximity type exposure apparatus
- Patent Title (中): 接近式曝光装置
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Application No.: US11319387Application Date: 2005-12-29
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Publication No.: US07692770B2Publication Date: 2010-04-06
- Inventor: Cheon-Soo Lee , Sang-Whan Cha , Hyun-Jang Shin
- Applicant: Cheon-Soo Lee , Sang-Whan Cha , Hyun-Jang Shin
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch, & Birch LLP
- Priority: KR10-2005-0022863 20050318
- Main IPC: G03B27/62
- IPC: G03B27/62 ; G03B27/42
Abstract:
An apparatus and method for aligning a substrate and a mask are discussed. In one aspect of the present invention, the apparatus includes a mask stage, wherein the mask stage includes a mask fixing stage configured to fixedly support a mask; a base stage supporting the mask fixing stage; and at least one guide unit disposed in the base stage, coupled to the mask fixing stage, and configured to move the mask fixing stage, so as to move the mask in a predetermined direction.
Public/Granted literature
- US20060209288A1 Proximity type exposure apparatus Public/Granted day:2006-09-21
Information query
