Invention Grant
- Patent Title: Imprint lithography
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Application No.: US11138899Application Date: 2005-05-27
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Publication No.: US07692771B2Publication Date: 2010-04-06
- Inventor: Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Wendela Kruijt-Stegeman
- Applicant: Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Wendela Kruijt-Stegeman
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03B27/02
- IPC: G03B27/02 ; G03B27/20

Abstract:
A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
Public/Granted literature
- US20060268256A1 Imprint lithography Public/Granted day:2006-11-30
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