Invention Grant
- Patent Title: Crystallization apparatus, optical member for use in crystallization apparatus, crystallization method, manufacturing method of thin film transistor, and manufacturing method of matrix circuit substrate of display
- Patent Title (中): 结晶装置,结晶装置中使用的光学构件,结晶方法,薄膜晶体管的制造方法以及显示器的矩阵电路基板的制造方法
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Application No.: US12403726Application Date: 2009-03-13
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Publication No.: US07692864B2Publication Date: 2010-04-06
- Inventor: Yukio Taniguchi , Masakiyo Matsumura , Hirotaka Yamaguchi , Mikihiko Nishitani , Susumu Tsujikawa , Yoshinobu Kimura , Masayuki Jyumonji
- Applicant: Yukio Taniguchi , Masakiyo Matsumura , Hirotaka Yamaguchi , Mikihiko Nishitani , Susumu Tsujikawa , Yoshinobu Kimura , Masayuki Jyumonji
- Applicant Address: JP Yokohama
- Assignee: Advanced LCD Technologies Development Center Co., Ltd.
- Current Assignee: Advanced LCD Technologies Development Center Co., Ltd.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2002-188846 20020628
- Main IPC: G02B27/10
- IPC: G02B27/10

Abstract:
A crystallization method includes wavefront-dividing an incident light beam into a plurality of light beams, condensing the wavefront-divided light beams in a corresponding phase shift portion of a phase shift mask or in the vicinity of the phase shift portion to form a light beam having an light intensity distribution of an inverse peak pattern in which a light intensity is minimum in a point corresponding to the phase shift portion of the phase shift mask, and irradiating a polycrystalline semiconductor film or an amorphous semiconductor film with the light beam having the light intensity distribution to produce a crystallized semiconductor film.
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