Invention Grant
- Patent Title: Structure for use in a projection exposure system for manufacturing semiconductors
- Patent Title (中): 用于制造半导体的投影曝光系统的结构
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Application No.: US10597872Application Date: 2005-02-22
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Publication No.: US07692881B2Publication Date: 2010-04-06
- Inventor: Yim-Bun Patrick Kwan , Bernhard Geuppert , Nico Kemper
- Applicant: Yim-Bun Patrick Kwan , Bernhard Geuppert , Nico Kemper
- Applicant Address: DE NL
- Assignee: Carl Zeiss SMT AG,ASML Netherlands B.V.
- Current Assignee: Carl Zeiss SMT AG,ASML Netherlands B.V.
- Current Assignee Address: DE NL
- Agency: GrayRobinson, PA
- Priority: DE102004009203 20040225
- International Application: PCT/EP2005/001826 WO 20050222
- International Announcement: WO2005/081029 WO 20050901
- Main IPC: G02B7/02
- IPC: G02B7/02

Abstract:
A structure for mounting an assembly of optical elements disposed within a housing, in particular of a projection lens assembly of a projection exposure system for manufacturing semiconductor elements includes a plurality of supporting elements, each respective one of which forms part of a respective one of a plurality of connections though which the housing of the assembly is connected to said supporting structure through which the weight of the assembly is transferred to the supporting structure in such a way that supporting forces generated by said supporting structure are taken up by pressure forces and shear forces which act on at least one of the supporting elements.
Public/Granted literature
- US20070165311A1 Housing structure for mounting optical elements Public/Granted day:2007-07-19
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
G02B7/02 | .用于透镜 |