Invention Grant
- Patent Title: Modeling and cross correlation of design predicted criticalities for optimization of semiconductor manufacturing
- Patent Title (中): 半导体制造优化设计预测临界值的建模与互相关
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Application No.: US11612446Application Date: 2006-12-18
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Publication No.: US07694244B2Publication Date: 2010-04-06
- Inventor: Kevin Chan , Emmanuel Drege , Nickhil Jakatdar , Svetlana Litvintseva , Mark A. Miller , Francis Raquel
- Applicant: Kevin Chan , Emmanuel Drege , Nickhil Jakatdar , Svetlana Litvintseva , Mark A. Miller , Francis Raquel
- Applicant Address: US CA San Jose
- Assignee: Cadence Design Systems, Inc.
- Current Assignee: Cadence Design Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Vista IP Law Group LLP
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
A method and apparatus for modeling and cross correlation of design predicted criticalities include a feedback loop where information from the manufacturing process is provided to cross correlation engine for optimization of semiconductor manufacturing. The information may include parametric information, functional information, and hot spots determination. The sharing of information allows for design intent to be reflected in manufacturing metrology space; thus, allowing for more intelligent metrology and reduces cycle time.
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