Invention Grant
US07694258B1 Method and apparatus for inserting metal fill in an integrated circuit (“IC”) layout
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用于将金属填充物插入集成电路(“IC”)布局的方法和装置
- Patent Title: Method and apparatus for inserting metal fill in an integrated circuit (“IC”) layout
- Patent Title (中): 用于将金属填充物插入集成电路(“IC”)布局的方法和装置
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Application No.: US11195334Application Date: 2005-08-01
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Publication No.: US07694258B1Publication Date: 2010-04-06
- Inventor: Judd Matthew Ylinen , Kwok Ming Yue
- Applicant: Judd Matthew Ylinen , Kwok Ming Yue
- Applicant Address: US CA San Jose
- Assignee: Cadence Design Systems, Inc.
- Current Assignee: Cadence Design Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Adeli & Tollen LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F9/455

Abstract:
Some embodiments of the invention provide a method for inserting several fills in an integrated circuit (“IC”) layout. The method identifies a set of potential fills in a region of an IC layout, where the set of potential fills has a first fill size, wherein the first fill size is from a set of fill sizes. The method specifies a halo around each potential fill in the set of potential fills. For each potential fill, the method determines whether the specified halo overlaps with a foreign object in the region of the layout. For each potential fill, the method specifies a legal fill in the region of the IC layout if the specified halo does not overlap with a foreign object in the region of the IC layout. The method inserts at least one legal fill in the region of the IC layout. In some embodiments, the halo is a spacing halo.
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