Invention Grant
US07694258B1 Method and apparatus for inserting metal fill in an integrated circuit (“IC”) layout 失效
用于将金属填充物插入集成电路(“IC”)布局的方法和装置

Method and apparatus for inserting metal fill in an integrated circuit (“IC”) layout
Abstract:
Some embodiments of the invention provide a method for inserting several fills in an integrated circuit (“IC”) layout. The method identifies a set of potential fills in a region of an IC layout, where the set of potential fills has a first fill size, wherein the first fill size is from a set of fill sizes. The method specifies a halo around each potential fill in the set of potential fills. For each potential fill, the method determines whether the specified halo overlaps with a foreign object in the region of the layout. For each potential fill, the method specifies a legal fill in the region of the IC layout if the specified halo does not overlap with a foreign object in the region of the IC layout. The method inserts at least one legal fill in the region of the IC layout. In some embodiments, the halo is a spacing halo.
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