Invention Grant
- Patent Title: Method for optimization of optical proximity correction
- Patent Title (中): 光学邻近校正优化方法
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Application No.: US11833465Application Date: 2007-08-03
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Publication No.: US07694268B2Publication Date: 2010-04-06
- Inventor: Gregory J. Dick
- Applicant: Gregory J. Dick
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: DeLio & Peterson, LLC
- Agent Peter W. Peterson
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method of designing and forming a mask used for projecting an image of an integrated circuit design. After providing a mask element corresponding to a portion of a design of an integrated circuit layout, the method includes correcting the mask element using OPC techniques, and fracturing the OPC-corrected mask element into a plurality of polygonal segments. The method then includes identifying along an edge of the mask element a polygon edge having a thickness less than that which can be normally reproduced by a mask writer, and modifying configuration of the identified mask element segment to add or subtract length to an end of the polygon to create a corrected mask element having increased resolution by the mask writer. The method then includes using an electron beam or other mask writer to form a mask having the mask element with modified configuration.
Public/Granted literature
- US20090037867A1 METHOD FOR OPTIMIZATION OF OPTICAL PROXIMITY CORRECTION Public/Granted day:2009-02-05
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