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US07694268B2 Method for optimization of optical proximity correction 有权
光学邻近校正优化方法

Method for optimization of optical proximity correction
Abstract:
A method of designing and forming a mask used for projecting an image of an integrated circuit design. After providing a mask element corresponding to a portion of a design of an integrated circuit layout, the method includes correcting the mask element using OPC techniques, and fracturing the OPC-corrected mask element into a plurality of polygonal segments. The method then includes identifying along an edge of the mask element a polygon edge having a thickness less than that which can be normally reproduced by a mask writer, and modifying configuration of the identified mask element segment to add or subtract length to an end of the polygon to create a corrected mask element having increased resolution by the mask writer. The method then includes using an electron beam or other mask writer to form a mask having the mask element with modified configuration.
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