Invention Grant
- Patent Title: Wet clean system design
- Patent Title (中): 湿清洁系统设计
-
Application No.: US11620610Application Date: 2007-01-05
-
Publication No.: US07694688B2Publication Date: 2010-04-13
- Inventor: Paul Lester , Scott Meyer , Wyland L. Atkins , Douglas Richards , Constantin Predoaica , Jeffrey Hudgens , Charles Carlson , Penchala Kankanala , Mike Rice , James S. Papanu , Evanson G. Baiya , John J. Rosato
- Applicant: Paul Lester , Scott Meyer , Wyland L. Atkins , Douglas Richards , Constantin Predoaica , Jeffrey Hudgens , Charles Carlson , Penchala Kankanala , Mike Rice , James S. Papanu , Evanson G. Baiya , John J. Rosato
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: B08B3/04
- IPC: B08B3/04

Abstract:
The present invention generally provides an apparatus and method for processing and transferring substrates in a multi-chamber processing system that has the capability of receiving and performing single substrate processing steps performed in parallel, while using the many favorable aspects of batch processing. Embodiments of the invention described herein are adapted to maximize system throughput, reduce system cost, reduce cost per substrate during processing, increase system reliability, improve the device yield on the processed substrates, and reduce system footprint. In one embodiment, the cluster tool is adapted to perform a wet/clean process sequence in which various substrate cleaning processes are performed on a substrate in the cluster tool.
Public/Granted literature
- US20080166208A1 WET CLEAN SYSTEM DESIGN Public/Granted day:2008-07-10
Information query
IPC分类: