An applicator device serves for application of a liquid medium. The applicator device has a reservoir for the medium and an applicator. The applicator is surrounded by a protective sleeve in the reservoir. The protective sleeve is rigidly connected with the reservoir. The inner diameter of the protective sleeve is constant in the vicinity of an applicator tip of the applicator and exceeds the outer diameter of the applicator penetrating into the reservoir. The protective sleeve extends down to a bottom of the reservoir and bears against the bottom via a resilient sleeve portion. As a result, an applicator device is obtained which provides for protection of the applicator tip and is easy to fabricate.