Invention Grant
- Patent Title: Discharging power source, sputtering power source, and sputtering device
- Patent Title (中): 放电电源，溅射电源和溅射装置
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Application No.: US10514561Application Date: 2003-05-30
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Publication No.: US07695599B2Publication Date: 2010-04-13
- Inventor: Noboru Kuriyama , Kazuhiko Imagawa
- Applicant: Noboru Kuriyama , Kazuhiko Imagawa
- Applicant Address: JP Yokohama-shi
- Assignee: Shibaura Mechatronics Corporation
- Current Assignee: Shibaura Mechatronics Corporation
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2002-160455 20020531
- International Application: PCT/JP03/06821 WO 20030530
- International Announcement: WO03/103348 WO 20031211
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C25B11/00 ; C25B13/00
Abstract:
A discharging power supply including a direct current power supply unit, a control unit for controlling an output of the direct current power supply unit, and a vibrating current generation unit having a capacitance connected in parallel with a pair of outputs from the direct current power supply unit and an inductance connected to at least one of the pair of outputs, wherein the control unit controls the direct current power supply unit so that current outputted from the direct current power supply unit does not exceed a limit current value in at least a portion of a range of voltage that can be outputted from the direct current power supply unit. Thus, regardless of whether the discharge power is set to be high or low, discharge current exceeding the limit characteristic line can be prevented from flowing.
Public/Granted literature
- US20060011473A1 Discharging power source, sputtering power source, and sputtering device Public/Granted day:2006-01-19
Information query
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