Invention Grant
- Patent Title: Micro fluidic device
- Patent Title (中): 微流体装置
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Application No.: US11439821Application Date: 2006-05-15
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Publication No.: US07695685B2Publication Date: 2010-04-13
- Inventor: Akira Koide , Yoshishige Endo , Yuzuru Ito
- Applicant: Akira Koide , Yoshishige Endo , Yuzuru Ito
- Applicant Address: JP Tokyo
- Assignee: Hitachi Plant Technologies, Ltd.
- Current Assignee: Hitachi Plant Technologies, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Townsend and Townsend and Crew LLP
- Priority: JP2005-143391 20050517
- Main IPC: B01L3/00
- IPC: B01L3/00 ; B01L3/02 ; B01L9/00

Abstract:
A dent is formed on a side surface of a first substrate. A second substrate faces to the side surface of the first substrate. A third substrate is arranged so that the first and second substrates contact each other closely. A micro flow path and a micro chamber are formed between the first and second substrates. The micro flow path and the micro chamber communicate with each other and including an inlet and outlet respectively. A fifth substrate contains the first, second and third substrates. A fourth substrate fits in the fifth substrate. The first and second substrates are pressed against each other by thread fastening (pressing means) for the fourth and fifth substrates.
Public/Granted literature
- US20060275180A1 Micro fluidic device Public/Granted day:2006-12-07
Information query
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