Invention Grant
- Patent Title: Photo-sensitive composition
- Patent Title (中): 光敏组合物
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Application No.: US10503248Application Date: 2003-02-05
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Publication No.: US07695875B2Publication Date: 2010-04-13
- Inventor: Fredericus Johannes Touwslager
- Applicant: Fredericus Johannes Touwslager
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips Electronics
- Current Assignee: Koninklijke Philips Electronics
- Current Assignee Address: NL Eindhoven
- Priority: EP02075473 20020205
- International Application: PCT/IB03/00400 WO 20030205
- International Announcement: WO03/067333 WO 20030814
- Main IPC: G03F7/021
- IPC: G03F7/021

Abstract:
The invention pertains to a photo-sensitive composition which comprises a photochemical initiator, a polyacid or a salt thereof, and a poly(3,4-alkylenedioxythiophene) wherein the alkylene moiety is —(CH2)n-, n being an integer from 1 to 3, or 1,2-cyclo-hexylene, which may optionally be substituted, characterized in that the photochemical initiator is a water-soluble polymer comprising at least two azide or diazonium groups. Preferably, the water-soluble polymer is chemically stable at pH 6 or less, more preferably at pH 2 or less.
Public/Granted literature
- US20050089791A1 Photo-sensitive composition Public/Granted day:2005-04-28
Information query
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