Invention Grant
US07695893B2 Photo-sensitive compound and photoresist composition including the same
失效
光敏化合物和包含其的光致抗蚀剂组合物
- Patent Title: Photo-sensitive compound and photoresist composition including the same
- Patent Title (中): 光敏化合物和包含其的光致抗蚀剂组合物
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Application No.: US12134840Application Date: 2008-06-06
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Publication No.: US07695893B2Publication Date: 2010-04-13
- Inventor: Jae-Woo Lee , Jung-Youl Lee , Jeong-Sik Kim , Eu-Jean Jang , Jae-Hyun Kim
- Applicant: Jae-Woo Lee , Jung-Youl Lee , Jeong-Sik Kim , Eu-Jean Jang , Jae-Hyun Kim
- Applicant Address: KR Incheon
- Assignee: Dongjin Semichem Co., Ltd.
- Current Assignee: Dongjin Semichem Co., Ltd.
- Current Assignee Address: KR Incheon
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2007-0056203 20070608
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/20 ; G03F7/30
Abstract:
Disclosed are a photo-sensitive compound and a photoresist composition containing the same, for forming ultra-fine photoresist patterns. The photo-sensitive compound is resented by following Formula 1, wherein x is an integer of 1 to 5, y is an integer of 2 to 6, R is a C2˜C20 hydrocarbon group. The photoresist composition comprises 1˜85 weight % of a photo-sensitive compound represented by following Formula 1, 1˜55 weight % of a compound which reacts with a hydroxyl group (—OH) of the compound represented by Formula 1 to combine with the photo-sensitive compound represented by Formula 1; 1˜15 weight % of a photo-acid generator; and 12˜97 weight % of an organic solvent.
Public/Granted literature
- US20080305430A1 PHOTO-SENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME Public/Granted day:2008-12-11
Information query
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