Invention Grant
- Patent Title: Method of manufacturing vertical gallium-nitride based light emitting diode
- Patent Title (中): 制造垂直氮化镓基发光二极管的方法
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Application No.: US12406540Application Date: 2009-03-18
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Publication No.: US07695989B2Publication Date: 2010-04-13
- Inventor: Doo Go Baik , Bang Won Oh , Seok Beom Choi , Su Yeol Lee
- Applicant: Doo Go Baik , Bang Won Oh , Seok Beom Choi , Su Yeol Lee
- Applicant Address: KR Gyunggi-do
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Gyunggi-do
- Agency: McDermott Will & Emery LLP
- Priority: KR10-2005-0117958 20051206
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A vertical GaN-based LED and a method of manufacturing the same are provided. The vertical GaN-based LED can prevent the damage of an n-type GaN layer contacting an n-type electrode, thereby stably securing the contact resistance of the n-electrode. The vertical GaN-based LED includes: a support layer; a p-electrode formed on the support layer; a p-type GaN layer formed on the p-electrode; an active layer formed on the p-type GaN layer; an n-type GaN layer for an n-type electrode contact, formed on the active layer; an etch stop layer formed on the n-type GaN layer to expose a portion of the n-type GaN layer; and an n-electrode formed on the n-type GaN layer exposed by the etch stop layer.
Public/Granted literature
- US20090181485A1 METHOD OF MANUFACTURING VERTICAL GALLIUM-NITRIDE BASED LIGHT EMITTING DIODE Public/Granted day:2009-07-16
Information query
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