Invention Grant
- Patent Title: Method of manufacturing device
- Patent Title (中): 制造装置的方法
-
Application No.: US12354542Application Date: 2009-01-15
-
Publication No.: US07696067B2Publication Date: 2010-04-13
- Inventor: Masaru Nakamura , Hirokazu Matsumoto
- Applicant: Masaru Nakamura , Hirokazu Matsumoto
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer, Burns & Crain, Ltd.
- Priority: JP2008-020336 20080131
- Main IPC: H01L21/30
- IPC: H01L21/30

Abstract:
A method of manufacturing a device includes: a laser beam-machined groove forming step of irradiating a wafer with a laser beam from the back side of the wafer along planned dividing lines so as to form laser beam-machined grooves along the planned dividing lines; an etching step of etching a back-side surface of the wafer having been subjected to the laser beam-machined groove forming step, so as to remove denatured layers formed at processed surfaces of the laser beam-machined grooves; an adhesive film attaching step of attaching an adhesive film to the back-side surface of the wafer having been subjected to the etching step, and adhering the adhesive film side of the wafer to a surface of a dicing tape; and an adhesive film rupturing step of expanding the dicing tape so as to rupture the adhesive film along individual devices.
Public/Granted literature
- US20090197395A1 METHOD OF MANUFACTURING DEVICE Public/Granted day:2009-08-06
Information query
IPC分类: