Invention Grant
- Patent Title: Method for manufacturing vertical light-emitting diode
- Patent Title (中): 制造垂直发光二极管的方法
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Application No.: US11971861Application Date: 2008-01-09
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Publication No.: US07696068B2Publication Date: 2010-04-13
- Inventor: Shi-Ming Chen
- Applicant: Shi-Ming Chen
- Applicant Address: TW Hsinchu
- Assignee: Epistar Corporation
- Current Assignee: Epistar Corporation
- Current Assignee Address: TW Hsinchu
- Agent Winston Hsu
- Priority: TW94131924A 20050915
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for manufacturing a vertical light-emitting diode is described. In the method for manufacturing the vertical light-emitting diode, a sapphire substrate is provided. An illuminant epitaxial structure is formed on the sapphire substrate. Next, a first conductivity type electrode is formed on a surface of the illuminant epitaxial structure. Then, a local removal step is performed to remove a portion of the sapphire substrate from another surface of the illuminant epitaxial structure and to expose a portion of the other surface of the illuminant epitaxial structure, wherein the other surface is opposite to the surface of the illuminant epitaxial structure. Subsequently, a second conductivity type electrode is formed on the exposed portion of the other surface of the illuminant epitaxial structure, wherein the first conductivity type electrode and the second conductivity type electrode are opposite conductivity types.
Public/Granted literature
- US20080108161A1 METHOD FOR MANUFACTURING VERTICAL LIGHT-EMITTING DIODE Public/Granted day:2008-05-08
Information query
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