Invention Grant
US07696077B2 Bottom electrode contacts for semiconductor devices and methods of forming same
有权
用于半导体器件的底部电极触点及其形成方法
- Patent Title: Bottom electrode contacts for semiconductor devices and methods of forming same
- Patent Title (中): 用于半导体器件的底部电极触点及其形成方法
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Application No.: US11487209Application Date: 2006-07-14
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Publication No.: US07696077B2Publication Date: 2010-04-13
- Inventor: Jun Liu
- Applicant: Jun Liu
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
Bottom electrode contact structures for a semiconductor assembly and a method for forming same are described. An exemplary semiconductor device comprises electrode contact structures in a phase change memory device. The phase change memory device comprising a phase change cell is made up of a bottom electrode contact structure comprising a phase change material liner connecting between a conductive top electrode and a conductive bottom electrode where the resulting ultra-small contacts are determined by the intersection of the sidewall bottom electrode and the phase change liner.
Public/Granted literature
- US20080014733A1 Bottom electrode contacts for semiconductor devices and methods of forming same Public/Granted day:2008-01-17
Information query
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