Invention Grant
US07696077B2 Bottom electrode contacts for semiconductor devices and methods of forming same 有权
用于半导体器件的底部电极触点及其形成方法

  • Patent Title: Bottom electrode contacts for semiconductor devices and methods of forming same
  • Patent Title (中): 用于半导体器件的底部电极触点及其形成方法
  • Application No.: US11487209
    Application Date: 2006-07-14
  • Publication No.: US07696077B2
    Publication Date: 2010-04-13
  • Inventor: Jun Liu
  • Applicant: Jun Liu
  • Applicant Address: US ID Boise
  • Assignee: Micron Technology, Inc.
  • Current Assignee: Micron Technology, Inc.
  • Current Assignee Address: US ID Boise
  • Main IPC: H01L21/44
  • IPC: H01L21/44
Bottom electrode contacts for semiconductor devices and methods of forming same
Abstract:
Bottom electrode contact structures for a semiconductor assembly and a method for forming same are described. An exemplary semiconductor device comprises electrode contact structures in a phase change memory device. The phase change memory device comprising a phase change cell is made up of a bottom electrode contact structure comprising a phase change material liner connecting between a conductive top electrode and a conductive bottom electrode where the resulting ultra-small contacts are determined by the intersection of the sidewall bottom electrode and the phase change liner.
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