Invention Grant
US07696082B2 Semiconductor device manufacturing method, semiconductor device, and wiring board
失效
半导体器件制造方法,半导体器件和布线基板
- Patent Title: Semiconductor device manufacturing method, semiconductor device, and wiring board
- Patent Title (中): 半导体器件制造方法,半导体器件和布线基板
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Application No.: US12015970Application Date: 2008-01-17
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Publication No.: US07696082B2Publication Date: 2010-04-13
- Inventor: Tetsuya Otsuki
- Applicant: Tetsuya Otsuki
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2007-012741 20070123
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L21/00

Abstract:
A semiconductor device manufacturing method includes (a) bonding a first surface of a metal plate to a substrate, (b) forming a plurality of metal posts that are arranged in vertical and lateral directions in a plan view and include a first metal post and a second metal post, by partially etching the metal plate bonded to the substrate from a second surface of the metal plate, (c) fixing an integrated circuit (IC) element to the second surface of the first metal post, (d) coupling the second metal post and a pad terminal of the integrated circuit element via a conductive material, (e) resin-sealing the integrated circuit element, the metal posts, and the conductive material by providing a resin onto the substrate, and (f) removing the substrate from the resin and the first surfaces of the metal posts sealed using the resin.
Public/Granted literature
- US20080174012A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE, AND WIRING BOARD Public/Granted day:2008-07-24
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