Invention Grant
US07696117B2 Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas 有权
减少暴露于含卤素等离子体的表面侵蚀速率的方法和装置

Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
Abstract:
A ceramic article which is resistant to erosion by halogen-containing plasmas used in semiconductor processing. The ceramic article includes ceramic which is multi-phased, typically including two phase to three phases. The ceramic is formed from yttrium oxide at a molar concentration ranging from about 50 mole % to about 75 mole %; zirconium oxide at a molar concentration ranging from about 10 mole % to about 30 mole %; and at least one other component, selected from the group consisting of aluminum oxide, hafnium oxide, scandium oxide, neodymium oxide, niobium oxide, samarium oxide, ytterbium oxide, erbium oxide, cerium oxide, and combinations thereof, at a molar concentration ranging from about 10 mole % to about 30 mole %.
Information query
Patent Agency Ranking
0/0