Invention Grant
- Patent Title: Cleaning compound and method and system for using the cleaning compound
- Patent Title (中): 清洁剂及使用清洁剂的方法和系统
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Application No.: US11347154Application Date: 2006-02-03
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Publication No.: US07696141B2Publication Date: 2010-04-13
- Inventor: Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
- Applicant: Erik M. Freer , John M. de Larios , Katrina Mikhaylichenko , Michael Ravkin , Mikhail Korolik , Fred C. Redeker
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla & Gencarella, LLP
- Main IPC: C11D1/02
- IPC: C11D1/02
Abstract:
A cleaning compound is provided. The cleaning compound includes about 0.1 weight percent to about 10 weight percent of a fatty acid dispersed in water. The cleaning compound includes an amount of a base sufficient to bring a pH of the fatty acid water solution to about a level where above about 50% of the dispersed fatty acid is ionized. A method for cleaning a substrate, a system for cleaning a substrate, and a cleaning solution prepared by a process are also provided.
Public/Granted literature
- US20060128600A1 Cleaning compound and method and system for using the cleaning compound Public/Granted day:2006-06-15
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