Invention Grant
US07696292B2 Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
有权
低分散度可光成像丙烯酸聚合物，光致抗蚀剂和微光刻工艺
- Patent Title: Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
- Patent Title (中): 低分散度可光成像丙烯酸聚合物，光致抗蚀剂和微光刻工艺
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Application No.: US10943063Application Date: 2004-09-16
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Publication No.: US07696292B2Publication Date: 2010-04-13
- Inventor: William Brown Farnham , Michael Fryd , Frank Leonard Schadt, III
- Applicant: William Brown Farnham , Michael Fryd , Frank Leonard Schadt, III
- Applicant Address: AU Act
- Assignee: Commonwealth Scientific and Industrial Research Organisation
- Current Assignee: Commonwealth Scientific and Industrial Research Organisation
- Current Assignee Address: AU Act
- Main IPC: C08F20/00
- IPC: C08F20/00 ; C08F2/00 ; G03C1/00
Abstract:
The invention pertains to low polydispersity acrylic polymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity polymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.
Public/Granted literature
- US20050119378A1 Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography Public/Granted day:2005-06-02
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