A steering component is included in an ion implantation system to direct or “steer” an ion beam to a scan vertex of a scanning component downstream of the steering component. In this manner, the scan vertex of the scanning component coincides with the focal point of a parallelizing component downstream of the scanning component. This allows the beam to emerge from the parallelizing component at an expected angle so that ions can be implanted in a desired manner into a workpiece located downstream of the parallelizing component.