Invention Grant
- Patent Title: Memory cell with memory material insulation and manufacturing method
- Patent Title (中): 记忆体与记忆材料的绝缘和制造方法
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Application No.: US11426771Application Date: 2006-06-27
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Publication No.: US07696506B2Publication Date: 2010-04-13
- Inventor: Hsiang-Lan Lung
- Applicant: Hsiang-Lan Lung
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Main IPC: H01L47/00
- IPC: H01L47/00

Abstract:
A memory cell, the memory cell includes first and second electrodes and a memory material element electrically coupling the first and second electrodes. The memory material element comprises a first memory material, such as GST, the first memory material having an electrical property that can be changed by the application of energy. A thermal insulating layer surrounds the memory material element. The thermal insulating layer comprises a second memory material. A dielectric layer separates the thermal insulating material from the memory material element. A method for making a thermally insulated memory cell device is also disclosed.
Public/Granted literature
- US20070298535A1 Memory Cell With Memory Material Insulation and Manufacturing Method Public/Granted day:2007-12-27
Information query
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