Invention Grant
- Patent Title: Indium nitride layer production
- Patent Title (中): 氮化铟层生产
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Application No.: US11662491Application Date: 2005-09-14
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Publication No.: US07696533B2Publication Date: 2010-04-13
- Inventor: Bernard Gil , Olivier Gérard Serge Briot , Sandra Ruffenach , Bénédicte Maleyre , Thierry Joseph Roland Cloitre , Roger-Louis Aulombard
- Applicant: Bernard Gil , Olivier Gérard Serge Briot , Sandra Ruffenach , Bénédicte Maleyre , Thierry Joseph Roland Cloitre , Roger-Louis Aulombard
- Applicant Address: FR Paris FR Montpellier
- Assignee: Centre National de la Recherche Scientifique (CNRS),Universite Montpellier II
- Current Assignee: Centre National de la Recherche Scientifique (CNRS),Universite Montpellier II
- Current Assignee Address: FR Paris FR Montpellier
- Agency: Foley & Lardner LLP
- Priority: FR0409813 20040916
- International Application: PCT/FR2005/002275 WO 20050914
- International Announcement: WO2006/032756 WO 20060330
- Main IPC: H01L29/20
- IPC: H01L29/20

Abstract:
The invention relates to a structure usable in electronic, optical or optoelectronic engineering which comprises a substantially crystalline layer made of an alloy consisting of at least one element of the column II of the periodic elements system and/or at least one element of the column IV of the periodic elements system and of N2 (said alloy being noted N-IV-N2), wherein said structure also comprises an InN layer. A method for producing an indium nitride layer, a substrate forming plate and the use thereof for indium nitride growth are also disclosed.
Public/Granted literature
- US20070269965A1 Indium Nitride Layer production Public/Granted day:2007-11-22
Information query
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