Invention Grant
US07696538B2 Sensor for measuring liquid contaminants in a semiconductor wafer fabrication process
有权
用于在半导体晶圆制造工艺中测量液体污染物的传感器
- Patent Title: Sensor for measuring liquid contaminants in a semiconductor wafer fabrication process
- Patent Title (中): 用于在半导体晶圆制造工艺中测量液体污染物的传感器
-
Application No.: US11371650Application Date: 2006-03-09
-
Publication No.: US07696538B2Publication Date: 2010-04-13
- Inventor: Won Lee , Evan E Patton
- Applicant: Won Lee , Evan E Patton
- Applicant Address: US CA San Jose
- Assignee: Novellus Systems, Inc.
- Current Assignee: Novellus Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: DeLio & Peterson, LLC
- Agent Robert Curcio
- Main IPC: H01L29/84
- IPC: H01L29/84

Abstract:
Liquid detection sensors are attached to both sides of a robotic arm end effector of a semiconductor wafer process system. The sensor mechanism or probe is situated on the front side and backside of the end effector, designed with electrical lines that are traced onto a polyester base material. The electrical lines are positioned in a serpentine formation. The high conductance of the sulfuric acid in the copper sulfate solution acts as the conductor between the traced lines. When the conductive liquid comes in contact with the traced lines, the lines short and the sensor activates or turns on.
Public/Granted literature
- US20060169977A1 Liquid detection end effector sensor and method of using the same Public/Granted day:2006-08-03
Information query
IPC分类: