Invention Grant
- Patent Title: Thin film transistor and method of fabricating the same
- Patent Title (中): 薄膜晶体管及其制造方法
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Application No.: US11529361Application Date: 2006-09-29
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Publication No.: US07696583B2Publication Date: 2010-04-13
- Inventor: Hyun-Eok Shin
- Applicant: Hyun-Eok Shin
- Applicant Address: KR Yongin
- Assignee: Samsung Mobile Display Co., Ltd.
- Current Assignee: Samsung Mobile Display Co., Ltd.
- Current Assignee Address: KR Yongin
- Agency: Stein McEwen, LLP
- Priority: KR10-2005-0092292 20050930
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94

Abstract:
A thin film transistor and a method of fabricating the same capable of reducing stress of a substrate caused by a metal layer of the drain and source electrodes, the thin film transistor including a substrate; a semiconductor layer disposed on the substrate and including source, drain and channel regions; a gate insulating layer disposed on the substrate including the semiconductor layer; a gate electrode disposed on the gate insulating layer to correspond to the channel region of the semiconductor layer; an interlayer insulating layer disposed on the substrate including the gate electrode, and having contact holes connected with the source and drain regions of the semiconductor layer; and source and drain electrodes connected with the source and drain regions through the contact holes, wherein the source and drain electrodes include a first metal layer, a second metal layer, and a metal oxide layer interposed between the first metal layer and the second metal layer. Accordingly, the thin film transistor can reduce stress of the substrate caused by a metal layer of the source and drain electrodes, thereby improving yield of an organic light emitting diode display device.
Public/Granted literature
- US20070075369A1 Thin film transistor and method of fabricating the same Public/Granted day:2007-04-05
Information query
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