Invention Grant
- Patent Title: MEMS device formed inside hermetic chamber having getter film
- Patent Title (中): 在具有吸气剂膜的密封室内形成MEMS器件
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Application No.: US12147197Application Date: 2008-06-26
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Publication No.: US07696622B2Publication Date: 2010-04-13
- Inventor: Tsuyoshi Takemoto , Hiroshi Nishida , Osamu Torayashiki , Takashi Ikeda , Ryuta Araki
- Applicant: Tsuyoshi Takemoto , Hiroshi Nishida , Osamu Torayashiki , Takashi Ikeda , Ryuta Araki
- Applicant Address: JP
- Assignee: Sumitomo Precision Products Co., Ltd.
- Current Assignee: Sumitomo Precision Products Co., Ltd.
- Current Assignee Address: JP
- Agency: Dorsey & Whitney LLP
- Priority: JP2007-168966 20070627; JP2008-155682 20080613
- Main IPC: H01L23/06
- IPC: H01L23/06
Abstract:
A MEMS device including a getter film formed inside a hermetic chamber provides stable performance of the MEMS device by electrically stabilizing the getter film. The MEMS device includes a movable portion and a fixed portion formed inside the hermetic chamber. The hermetic chamber is formed by a base material of the MEMS device and glass substrates and having a cavity and cavities made therein. A part of any continuous getter film formed inside the hermetic chamber connects to only one of any one or a plurality of predetermined electrical potentials of the fixed portion and a ground potential of the fixed portion through the base material of the MEMS device.
Public/Granted literature
- US20090001565A1 MEMS DEVICE FORMED INSIDE HERMETIC CHAMBER HAVING GETTER FILM Public/Granted day:2009-01-01
Information query
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